520-294-5600 4dinfo@nanometrics.com

Lithography optics

Optics for photolithography applications must adhere to exceedingly tight tolerances for transmitted wavefront quality. These optics may function at deep ultraviolet  (DUV) wavelengths. The challenges are numerous for these measurements, including the need to protect the exotic coatings of the test and reference optics,  high power sources to generate sufficient beam contrast, etc.

The FizCam DUV dynamic laser interferometer measures microlithography optics and optical systems at deep ultra-violet (DUV) wavelengths. Acquiring data in less than 1 millisecond the FizCam DUV can measure accurately despite the heavy vibration and air turbulence typical of DUV compliant clean rooms.

Added Technical Resources

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Measuring Transmitted Wavefront Error with the FizCam 2000

A new technique for vibration-insensitive measurement of transmitted wavefront error (TWE) improves repeatability by more than 7X.

Products for Lithography Optics

FizCam DUV

The FizCam DUV dynamic laser interferometer measures microlithography optics and optical systems at deep ultra-violet (DUV) wavelengths.

Get In Touch

(520) 294-5600

Location

3280 E Hemisphere Loop Rd, Ste 146
Tucson, AZ 85706

Email

4Dinfo@nanometrics.com

Office Hours (Arizona Time)

Mon: 8am - 5pm
Tue: 8am - 5pm
Wed: 8am - 5pm
Thur: 8am - 5pm
Fri: 8am - 5pm
Sat: Closed
Sun: Closed

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